ACM Research, Inc. has delivered its first Ultra Lith Baker system to a global display panel manufacturer. This system addresses industry challenges in lithography, maintaining stable yield and pattern fidelity as device geometries shrink. The system offers ±5% UV intensity uniformity and supports various exposure modes. ACM’s President, Dr. David Wang, emphasized the importance of uniform process control for consistent yield and performance. The Ultra Lith BK integrates advanced thermal management and flexible configuration options for different process recipes. ACM Research specializes in semiconductor process equipment for improved productivity and product yield.

Read more at GlobeNewswire: ACM Research Delivers Advanced Ultra Lith BK Photoresist