ACM Research, Inc. has launched its first Ultra Lith KrF track system, designed for front-end semiconductor manufacturing, delivering high-throughput performance, advanced thermal control, and real-time process monitoring. The system was shipped to a leading Chinese logic wafer fab customer in September 2025. This system builds on the success of ACM’s ArF track platform and features a flexible process module configuration with industry-leading thermal uniformity. The Ultra Lith KrF track system achieves throughput greater than 300 wafers per hour and incorporates proprietary technology for improved production efficiency and stability. ACM aims to address a broader range of lithography challenges with this new system.

Read more at GlobeNewswire: ACM Research Delivered Its First High-Throughput Ultra Lith